Elpida Memory, Inc.
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History

1999    
  December Established and registered (trade name at establishment: NEC Hitachi Memory, Inc.)
2000    
  April Began development operations for DRAM products, using 0.11µm or lower process
  May Changed trade name to Elpida Memory, Inc. (announced in September 2000)
2001    
  February Began construction of 300mm wafer fabrication plant (hereafter, E300 Fab)
    Started sales operations in domestic market
  March Started sales operations in foreign markets (North America, Europe, and Asia)
2003    
  January Completed trial manufacturing at E300 Fab and began production activities
  March Took on Mitsubishi Electric Corporation's DRAM operations and employed Mitsubishi development engineers
    Finalized DRAM purchasing contract with Powerchip Semiconductor Corporation of Taiwan (hereafter, PSC)
  August Finalized agreement with PSC for 0.11µm or lower DRAM design and process technology license
  September Established Hiroshima Elpida Memory, Inc. (hereafter, Hiroshima Elpida) as a subsidiary responsible for production
  November Reached basic agreement with Hiroshima University for comprehensive research collaboration
  December Finalized agreement with China-based foundry company Semiconductor Manufacturing International Corporation for entrusting DRAM production to that company
2004    
  June Began expansion of E300 Fab
  September Completed the asset purchase by Hiroshima Elpida, of the land, buildings, and production facilities required for operation previously owned by NEC Hiroshima, Ltd.
  November Listed on the Tokyo Stock Exchange
2005    
  February Ovonyx and Elpida signed a technology licensing and support agreement for phase change memory
  July Reached agreement with ADVANTEST CORPORATION, Kingston Technology Japan, LLC, and Powertech Technology Inc. (Taiwan) the joint creating of a new company, Tera Probe, Inc., to be located in Japan for DRAM wafer testing
  October Commenced mass production of 90nm DRAM chips on E300 Fab Area 2
2006 January Established Kansai Design Center, located in Osaka, Japan
  March Formed a cooperative relationship with Singapore FTD Technology Pte. Ltd. (hereafter, FTD) to establish Edison Semiconductor Pvt. Ltd., a subsidiary of FTD, in India as a design center
  July Established Akita Elpida Memory, Inc. (hereafter, Akita Elpida) to take on the development of advanced back-end technology processes and the manufacture of advanced packages
  October Established the Tohoku Design Center
  December Commenced mass production of the world's first 70nm process DRAMs
2007 January Reached official agreement with PSC regarding a DRAM manufacturing joint company, Rexchip Electronics Corporation
  April Joined the IMEC CMOS research platform
    Hiroshima Elpida of its 200mm wafer processing equipment to Cension Semiconductor Manufacturing Corporation
    Akita Elpida successfully developed the world's thinnest 1.4mm multi chip package with 20 stacked dies
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